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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP

Das Fraun­ho­fer FEP wid­met sich der Ent­wick­lung inno­va­ti­ver Lösun­gen, Tech­no­lo­gien und Pro­zesse zur Ver­ede­lung von Ober­flä­chen und für die orga­ni­sche Elek­tro­nik. Unsere Kern­kom­pe­ten­zen Elek­tro­nen­strahl­tech­no­lo­gie, Sput­tern, plas­ma­ak­ti­vierte Hoch­rate­be­damp­fung, Hoch­rate-PECVD sowie Tech­no­lo­gien für orga­ni­sche Elek­tro­nik und IC-/ Sys­tem­de­sign nut­zen wir zur Lösung viel­fäl­ti­ger indus­tri­el­ler Pro­blem­stel­lun­gen der Ober­flä­chen­be­hand­lung, Vaku­um­be­schich­tung und der orga­ni­schen Halb­lei­ter.

Wir bie­ten ab dem Win­ter­se­mes­ter 2019/2020 eine

Prak­ti­kums­ar­beit

zum Thema „Nano­par­ti­cles effect of aggre­ga­tion source and volume"

Auf­ga­ben­be­sch­rei­bung:

Metal Nano­par­ti­cle lay­ers obtai­ned by gas-phase con­den­sa­tion using Gas Flow Sput­te­ring (GFS) pro­cess.

Fun­da­men­tal inves­ti­ga­ti­ons for the genera­tion, growth and depo­si­tion of metal NPs (Ag and/or Cu) obtai­ned by gas aggre­ga­tion using Gas Flow Sput­te­ring (GFS) pro­ces­ses shall be per­for­med. The aggre­ga­tion plasma will be cha­rac­te­ri­zed (OES, Plasma poten­tial, dusty plasma effects). Mean­while, simu­la­tion of the gas flow in the gas aggre­ga­tion cham­bers will be car­ried out in con­junc­tion with our own expe­ri­men­tal inves­ti­ga­ti­ons. These fin­dings will sub­se­quently be used for pro­cess opti­mi­za­tion and for the pro­duc­tion of coa­tings for medi­cal and sen­sors app­li­ca­ti­ons. In the field of pre­cision coa­tings, high demands are pla­ced on the uni­for­mity of layer pro­per­ties.
The obtai­ned coa­tings will be cha­rac­te­ri­zed by UV-VIS spec­tro­scopy and con­duc­tivity mea­su­res. Results will be com­pa­red with those obtai­ned in lite­ra­ture. Pos­si­bly, NP size mea­su­rements will be car­ried out using SEM/TEM.

Sub­tasks:
  • Car­ry­ing out coa­ting expe­ri­ments using Gas Flow Sput­te­ring (GFS) setup (in Dres­den)
  • Cha­rac­te­ri­za­tion of the lay­ers (UV-VIS spec­tro­scopy, Nano­par­ti­cle size dis­tri­bu­tion)
  • Simu­la­tion of gas flow and velo­city dis­tri­bu­tion using Com­sol RANS models for dif­fe­rent geo­me­tries.
  • Phy­si­cal inter­pre­ta­tion of obser­ved results and fit­ting of obtai­ned results using non-dimen­sio­nal num­bers.
  • Opti­mi­za­tion of pro­cess para­me­ters for desi­red par­ti­cle size.

Er­war­te­te Qua­li­fi­ka­tio­nen:

The announ­ce­ment is addres­sing stu­dents of phy­sics, elec­tri­cal engi­nee­ring and other engi­nee­ring fields. They should have know­ledge in phy­sics or mate­ri­als sci­ence and pre­fer­a­bly also basic know­ledge in one of the areas of thin-film tech­no­logy or plasma Tech­no­logy.

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